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Specifications
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Manufactered by : CRC Industries Europe NV Touwslagerstraat 1 – 9240 Zele – Belgium Tel (32) (0) 52/45.60.11 Fax

Specifications
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Content	Manufactered by : CRC Industries Europe NV Touwslagerstraat 1 – 9240 Zele – Belgium Tel (32) (0) 52/45.60.11 Fax (32) (0) 52/45.00.34 Technical Data Sheet KONTAKT CHEMIE Positiv 20 Page 1/5 Photo-positive resist KONTAKT CHEMIE Positiv 20 Description: Liquid photo-resist with 0-Naphtho-chinon-diazide / Novolack base General properties and applications: KONTAKT CHEMIE Positiv 20 is a classic liquid photo-resist for a wide variety of applications. The product can be applied anywhere where patterns must be transferred directly onto working materials for processing by etching, electroplating, etc. Typical applications are the production of printed circuit boards, a range of photo-lithographical processes on metals, glass and suitable synthetic materials. The lacquer is at its most photo-sensitive at close ultra-violet range (UVA). The lacquer should therefore be applied in yellow light. Windows can be darkened with yellow Plexiglass (e.g. Röhm Darmstadt, Type Yellow 303). KONTAKT CHEMIE Positiv 20 is resistant to oxidizing agents, ammoniacal to strongly acidic solutions. Coats of Positiv 20 which are no longer required can be easily removed (stripped) by solvents (Ester, Ketone) or 10 to 30 % sodium or potasium hydroxide aqueous solution. Technical data As delivered Colour blue, transparent Aerosol Flash point <0°C Density at 20°C FEA 605 0.780 g/cm3 coverage Filmthickness 8 µm calculated 1 m2/ 200 ml spray Bulk Flash point ASTM D 56 <0°C Density ASTM D 891 (C) 0.871 g/cm3 Coverage at 8 µm calculated 8.4 m2/l
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